NuFlare Orders Next Generation Photomask Registration and Overlay Metrology System from Carl Zeiss
2008-12-03 18:58:04 -
www.businesswire.com/cgi-bin/mmg.cgi?eid=5845149 - NuFlare Technology, the world leading supplier of e-beam based mask writers for cutting edge lithography masks, has ordered one of the first PROVE" systems for Photomask Registration and Overlay Metrology from Carl Zeiss SMT.
Frank P. Averdung, Managing Director at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS), considers the NuFlare order as a crucial breakthrough: "Supported by SEMATECH, we have successfully developed a future-oriented design concept for these systems that will play a decisive role in lithography. Both 193nm lithography including Double Patterning and EUVL will significantly benefit from the unprecedented accuracy of the system. With NuFlare"s selection of ZEISS, our system has been acknowledged as the de facto standard for calibration of the leading photomask writing tools."
Yasuaki Miura, President of NuFlare Technology states: "NuFlare is convinced that the PROVE" system of Carl Zeiss SMT enables a dramatic performance improvement of our mask writing systems. Our efforts of writing masks for EUV and NIL, as well as the emergent Double Patterning and Double Exposure technologies, will be empowered. It seems there is no better combination than PROVE and our mask writing systems to realize the requirements of the future."
The system
The key component of PROVE" is the diffraction limited, high resolution imaging optics operating at 193nm " corresponding to at-wavelength metrology for the majority of current and future photomask applications. It provides flexible illumination for maximum contrast imaging and enables "in-die" pattern placement analysis on production patterns.
The new metrology system, PROVE", was developed by a team of more than 40 Carl Zeiss SMT engineers and supported by SEMATECH. "For this development, we have exploited the core competencies of Carl Zeiss SMT, in particular our long-term experience in 193nm lithography optics as well as our more than 15 years of experience with the unique AIMS" mask metrology tools?, Averdung added.
Caption: Yasuaki Miura, President of NuFlare Technology (left) and Frank P. Averdung, Carl Zeiss SMT (right), sealed the deal with a handshake.
About Carl Zeiss SMT
As the innovation leader for lithography optics, as well as optical and particle-beam based inspection, analysis and measuring systems, Carl Zeiss SMT opens up new avenues for its customers in industrial manufacturing environments, quality assurance and industrial and university R&D. The basis for this success is its leading know-how in light, electron and ion-optical technologies. Together with its subsidiaries in Germany, England, France, Israel, Singapore and the USA, the international group of companies has more than 2,500 employees. In fiscal year 2006/07, Carl Zeiss SMT AG generated revenues of over EUR 1.000 million. Carl Zeiss SMT AG is a wholly owned subsidiary of Carl Zeiss AG. Further information: www.smt.zeiss.com
About NuFlare Technology
NuFlare Technology, Inc. is a supplier of mask writing systems, mask inspection systems, and epitaxial reactor systems. NuFlare has the world's top market share in mask writing systems as well as being a technology leader in mask writing system with its production, R&D and support sites in Japan, USA, Germany, Korea and Taiwan. In fiscal year 2007/2008, NuFlare Technology, Inc. generated revenues of over JPY 20 billion, and the company had 390 employees. NuFlare Technology, Inc. is listed on the JASDAQ Securities Exchange. For further information: www.nuflare.co.jp
Carl Zeiss SMT
Nadine Schütze, +49 3641 64 2242
n.schuetze@smt.zeiss.com
or
Carl Zeiss SMT Inc.
Bill Monigle, 941-497-1622
b.monigle@smt.zeiss.com
