2008-02-20 03:26:51 -
www.nanometrics.com - Nanometrics Incorporated Kevin Heidrich, 408-545-6000 Fax: 408-317-1346 kheidrich@nanometrics.com or Loomis Group (Public Relations) Vincent Mayeda, 909-590-9324 Fax: 909-517-1787 mayedav@loomisgroup.com Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced metrology equipment to the semiconductor industry, today announced the 1,000th shipment of its Integrated Metrology(R) (IM) system, highlighting the company's leadership position in
the IM market for semiconductor manufacturing. The milestone system was a Nanometrics 9010 SCRIBE unit integrated into an advanced plasma etch system used to control critical gate etch applications in advanced logic devices.
Nanometrics introduced its first IM system in 1998, an ultra-compact, real-time metrology system used in chemical mechanical polishing (CMP) thickness control applications. "Due to rapid customer acceptance and advancing process control requirements, Nanometrics' integrated metrology products evolved into a leading-edge tool set specializing in CMP, CVD, etch, and photolithography process control applications," said Steve Bradley, Nanometrics' director of Integrated Metrology Business. "Our customers see substantial improvements in process control capability and end of line product yield as a benefit of integrated metrology adoption. Reaching this milestone in such a short time reflects the industry's ongoing acceptance of integrated metrology and Nanometrics' commitment to innovative process control solutions."
Nanometrics 9000 Series IM systems provide 300 mm thin film and optical critical dimension (OCD) metrology solutions for all critical semiconductor processing applications. The 9000 Series incorporate state-of-the-art motion-control, optics, and modeling software, enabling comprehensive control over critical processes, including measurement of complex film stacks as well as 2D and 3D modeling of advanced structures.
About Nanometrics
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used in semiconductor manufacturing. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon and compound semiconductor devices, during various steps of the manufacturing process. These systems enable semiconductor manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on the NASDAQ Global Market under the symbol NANO. Nanometrics' website is
www.nanometrics.com.
Integrated Metrology Systems Provide Film Analysis, OCD
Measurement Options